Executive vice president for NXE EUV machine line, states the upgrade should allow customers to process 330 wafers per hour by 2030.
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ASML achieves breakthrough in EUV light source technology, increasing power from 600 to 1,000 watts, enabling chip manufacturers to process 330 wafers per hour by 2030 and reduce fabrication costs.
“Executive vice president for NXE EUV machine line, states the upgrade should allow customers to process 330 wafers per hour by 2030.”