ASML
Lead technologist for EUV light sources, discusses the new 1,000-watt system capability and future potential to reach 1,500-2,000 watts.
How media typically covers Michael Purvis
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ASML achieves breakthrough in EUV light source technology, increasing power from 600 to 1,000 watts, enabling chip manufacturers to process 330 wafers per hour by 2030 and reduce fabrication costs.
“Lead technologist for EUV light sources, discusses the new 1,000-watt system capability and future potential to reach 1,500-2,000 watts.”